The large-aperture pulse compression grating (PCG) is a critical component in generating an ultra-high-intensity, ultra-short-pulse laser; however, the size of the PCG manufactured by transmission holographic exposure is limited to large-scale high-quality materials. The reflective method is a potential way for solving the size limitation, but there is still no successful precedent due to the lack of scientific specifications and advanced processing technology of exposure mirrors. In this paper, an analytical model is developed to clarify the specifications of components, and advanced processing technology is adopted to control the spatial frequency errors. Hereafter, we have successfully fabricated a multilayer dielectric grating of 200 mm × 150 mm by using an off-axis reflective exposure system with Φ300 mm. This demonstration proves that PCGs can be manufactured by using the reflection holographic exposure method and shows the potential for manufacturing the meter-level gratings used in 100 petawatt class high-power lasers.

To reveal the physical mechanism of laser ablation and establish the prediction model for figuring the surface of fused silica, a multi-physical transient numerical model coupled with heat transfer and fluid flow was developed under pulsed CO2 laser irradiation. The model employed various heat transfer and hydrodynamic boundary and thermomechanical properties for assisting the understanding of the contributions of Marangoni convention, gravitational force, vaporization recoil pressure, and capillary force in the process of laser ablation and better prediction of laser processing. Simulation results indicated that the vaporization recoil pressure dominated the formation of the final ablation profile. The ablation depth increased exponentially with pulse duration and linearly with laser energy after homogenous evaporation. The model was validated by experimental data of pulse CO2 laser ablation of fused silica. To further investigate laser beam figuring, local ablation by varying the overlap rate and laser energy was conducted, achieving down to 4 nm homogenous ablation depth.

A real-time monitoring system is set up based on a computer, dynamic interferometer, beam expanding system, and a beam reflecting system. The stability and repeatability of the monitoring system is verified. A workpiece and a glass monitoring plate are placed in the same ring. The surface figure of the workpiece, monitored by the monitoring plate, synchronizes with the surface of the glass monitoring plate in terms of peak–valley and power. The influence of the reflection and transmission surface are discussed in theory and a numeral deviation in online and offline testing data is quantitatively analyzed. The new method provides a quick and easy real-time method to characterize changes to the optical surface during polishing.

The combination of deep wet etching and a magneto-rheological finishing (MRF) process is investigated to simultaneously improve laser damage resistance of a fused-silica surface at 355 nm. The subsequently deposited SiO2 coatings are researched to clarify the impact of substrate finishing technology on the coatings. It is revealed that a deep removal proceeding from the single side or double side had a significant impact on the laser-induced damage threshold (LIDT) of the fused silica, especially for the rear surface. After the deep etching, the MRF process that followed does not actually increase the LIDT, but it does ameliorate the surface qualities without additional LIDT degradation. The combination guarantee both the integrity of the surface’s finish and the laser damage resistance of the fused silica and subsequent SiO2 coatings.

Nanosecond single- and multiple-pulse laser damage studies on HfO2/SiO2 high-reflection (HR) coatings are performed at 532 nm. For single-pulse irradiation, the damage is attributed to the defects and the electric intensity distribution in the multilayer thin films. When the defect density in the irradiated area is high, delamination is observed. Other than the 1064 nm laser damage, the plasma scalding of the 532 nm laser damage is not pits-centered for normal incidence, and the size of the plasma scalding has no relation to the defect density and position, but increases with the laser fluence. For multiple-pulse irradiations, some damage sites show deeper precursors than those from the single-shot irradiation due to the accumulation effects. The cumulative laser-induced damages behave as pits without the presence of plasma scalding, which is unaffected by the laser fluence and shot numbers. The damage morphologies and depth information both confirm the fatigue effect of a HfO2/SiO2 HR coating under 532 nm laser irradiation.

The defect evolution is investigated for high-reflective coatings under multiple irradiations with an improved statistical model. The fatigue effect is observed with an increase in the shot numbers, but the fatigue process will not endure and it tends to be saturated when the number of shots reaches a certain level. With the addition of a bilayer unit, the defect density distribution of the high-reflective coatings is obtained. Two defect types are identified, and the differentiation of the high-damage precursors can well explain the decrease of the laser-induced damage threshold, as well as the saturation effect.